Oxford Instruments Plasmalab System 100 ICP-RIE

Oxford Instruments PlasmalabSystem100 ICP-RIE

The Oxford Inductively-Coupled Plasma Reactive Ion Etch system is currently configured to etch a wide range of materials with anisotropic features. Current process gasses available are: sulfur hexafluoride, octafluorocyclobutane, argon, oxygen, silicon tetrafluoride, boron trichloride, chlorine, methane and hydrogen.


CMADP Upcoming Events

Ralph N. Adams Lectureship, KU Chemistry Dept.

R. Mark Wightman, Ph.D.
Professor Emeritus of Chemistry
University of North Carolina, Chapel Hill

Public Lecture "Detecting Catecholamines--A Journey from Beaker to the Behaving Brain"
Thursday, November 15 @ 4:00pm
Integrated Science Building, Room 1154 (Central District)

Scientific Lecture "Chemical Monitoring of Neurotransmission with Microelectrodes"
Friday, November 16 @ 4:00pm
Integrated Science Building, Room 1154 (Central District)

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