Core Research Resource Lab
Oxford Instruments Plasmalab 80 Plus PECVD

PECVD

The Oxford Plasma-Enhanced Chemical Vapor Deposition system is currently configured to deposit thin films of dielectric materials, such as silicon dioxide and silicon nitride. The instrument will soon be upgraded for carbon nanotube production as well. Current process gasses available are: ammonia, nitrous oxide, oxygen-tetrafluoromethane mix (20:80), nitrogen, and silane (2%).


CMADP Upcoming Events

Analytical Chemistry Seminar
KU Chemistry Dept. (co-sponsored by COBRE CMADP)

Nathan A. Lacher, Ph.D.
Associate Research Fellow, Group Leader
Analytical R&D, Pfizer Inc.

"Development of Conjugate Vaccines at Pfizer"
Monday, February 17, 2020 at 3:30pm
Simons Auditorium, HBC, West Campus

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