Core Research Resource Lab
Oxford Instruments Plasmalab 80 Plus PECVD

PECVD

The Oxford Plasma-Enhanced Chemical Vapor Deposition system is currently configured to deposit thin films of dielectric materials, such as silicon dioxide and silicon nitride. The instrument will soon be upgraded for carbon nanotube production as well. Current process gasses available are: ammonia, nitrous oxide, oxygen-tetrafluoromethane mix (20:80), nitrogen, and silane (2%).


CMADP Upcoming Events

KU Bioengineering Colloquium
co-sponsored by COBRE CMADP

Daniel Citterio, Ph.D.
Professor of Applied Chemistry
Keio University, Yokohama, Japan

"Low-Cost Analytical Devices Made from Porous Substrates: Simple is the Best"
Friday, February 28, 2020 at 2:00pm
Learned Hall, Room 3150

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