ABM UV Flood Source and Mask Alignment System

ABM Flood Source

The ABM, Inc. i-line (365 nm) near-UV flood source produces light with an intensity of 20 mW/cm2. The automatic shutter is controlled by a timer with 0.1 s precision. An optional long-pass filter cuts out wavelengths below 345 nm.

The substrate chuck and mask frame are planarizable. Both soft contact and adjustable hard vacuum contact are possible. Chuck and frame combinations are available for 4" (square and round) and 6" (round) substrates.

The alignment system from OAI features dual inspection microscopes with CCD cameras. Stage adjustments (x, y, and Θ) can be made using 100 TPI positioners.

Reserve the Photolithography Room


CMADP Upcoming Events

TBA

KU Today