Oxford Instruments Plasmalab System 100 ICP-RIE

Oxford Instruments PlasmalabSystem100 ICP-RIE

The Oxford Inductively-Coupled Plasma Reactive Ion Etch system is currently configured to etch a wide range of materials with anisotropic features. Current process gasses available are: sulfur hexafluoride, octafluorocyclobutane, argon, oxygen, silicon tetrafluoride, boron trichloride, chlorine, methane and hydrogen.


CMADP Upcoming Events

Analytical Chemistry Seminar co-sponsored by COBRE CMADP
"Oxytocinergic circuits controlling defensive behavior in larval zebrafish"

Adam Douglass, Ph.D.
Assistant Professor of Neurobiology & Anatomy
University of Utah School of Medicine

Monday, September 10 @ 3:30pm
Simons Auditorium, HBC, KU-L West Campus

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