Oxford Instruments Plasmalab System 100 ICP-RIE

Oxford Instruments PlasmalabSystem100 ICP-RIE

The Oxford Inductively-Coupled Plasma Reactive Ion Etch system is currently configured to etch a wide range of materials with anisotropic features. Current process gasses available are: sulfur hexafluoride, octafluorocyclobutane, argon, oxygen, silicon tetrafluoride, boron trichloride, chlorine, methane and hydrogen.


CMADP Upcoming Events

Analytical Chemistry Seminar
KU Chemistry Dept. (co-sponsored by COBRE CMADP)

Meredith Hartley, Ph.D.
Assistant Professor of Chemistry (Spring 2020)
University of Kansas

"Lipids, hormones, and myelin disease: characterizing connections and therapeutic utility"
Monday, October 28, 2019 at 3:30pm
Simons Auditorium, HBC, West Campus

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