Core Research Resource Lab
Oxford Instruments Plasmalab System 100 ICP-RIE

Oxford Instruments PlasmalabSystem100 ICP-RIE

The Oxford Inductively-Coupled Plasma Reactive Ion Etch system is currently configured to etch a wide range of materials with anisotropic features. Current process gasses available are:

  • Sulfur hexafluoride
  • Octafluorocyclobutane
  • Argon
  • Oxygen
  • Methane
  • Hydrogen

Resources:


CMADP Upcoming Events

HBC Inaugural Brenda Shivers Lecture
by Prof. Eugenia Trushina
Dept. of Neurology and Pharmacology
Mayo Clinic, Rochester, MN

"Exploiting mitochondrial signaling for therapy of neurodegenerative diseases"
Friday, May 14, 2021 at 10:00am

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