Oxford Instruments Plasmalab 80 Plus PECVD

PECVD

The Oxford Plasma-Enhanced Chemical Vapor Deposition system is currently configured to deposit thin films of dielectric materials, such as silicon dioxide and silicon nitride. The instrument will soon be upgraded for carbon nanotube production as well. Current process gasses available are: ammonia, nitrous oxide, oxygen-tetrafluoromethane mix (20:80), nitrogen, and silane (2%).


CMADP Upcoming Events

Analytical Chemistry Seminar co-sponsored by COBRE CMADP
"Oxytocinergic circuits controlling defensive behavior in larval zebrafish"

Adam Douglass, Ph.D.
Assistant Professor of Neurobiology & Anatomy
University of Utah School of Medicine

Monday, September 10 @ 3:30pm
Simons Auditorium, HBC, KU-L West Campus

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