Oxford Instruments Plasmalab 80 Plus PECVD

PECVD

The Oxford Plasma-Enhanced Chemical Vapor Deposition system is currently configured to deposit thin films of dielectric materials, such as silicon dioxide and silicon nitride. The instrument will soon be upgraded for carbon nanotube production as well. Current process gasses available are: ammonia, nitrous oxide, oxygen-tetrafluoromethane mix (20:80), nitrogen, and silane (2%).


CMADP Upcoming Events

Ralph N. Adams Lectureship, KU Chemistry Dept.

R. Mark Wightman, Ph.D.
Professor Emeritus of Chemistry
University of North Carolina, Chapel Hill

Public Lecture "Detecting Catecholamines--A Journey from Beaker to the Behaving Brain"
Thursday, November 15 @ 4:00pm
Integrated Science Building, Room 1154 (Central District)
Reception immediately following lecture in ISB atrium, open to all

Scientific Lecture "Chemical Monitoring of Neurotransmission with Microelectrodes"
Friday, November 16 @ 4:00pm
Integrated Science Building, Room 1154 (Central District)

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