Core Research Resource Lab
Oxford Instruments Plasmalab 80 Plus PECVD

PECVD

The Oxford Plasma-Enhanced Chemical Vapor Deposition system is currently configured to deposit thin films of dielectric materials, such as silicon dioxide and silicon nitride. Current process gasses available are: ammonia, nitrous oxide, oxygen-tetrafluoromethane mix (20:80), nitrogen, and silane (2%).


CMADP Upcoming Events

HBC Inaugural Brenda Shivers Lecture
by Prof. Eugenia Trushina
Dept. of Neurology and Pharmacology
Mayo Clinic, Rochester, MN

"Exploiting mitochondrial signaling for therapy of neurodegenerative diseases"
Friday, May 14, 2021 at 10:00am

Register to receive Zoom invitation and password

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