ABM UV Flood Source & Mask Alignment System

ABM Flood Source

The ABM, Inc. i-line (365 nm) near-UV flood source produces light with an intensity of 20 mW/cm2. The automatic shutter is controlled by a timer with 0.1 s precision. An optional long-pass filter cuts out wavelengths below 345 nm.

The substrate chuck and mask frame are planarizable. Both soft contact and adjustable hard vacuum contact are possible. Chuck and frame combinations are available for 4" (square and round) and 6" (round) substrates.

The alignment system from OAI features dual inspection microscopes with CCD cameras. Stage adjustments (x, y, and Θ) can be made using 100 TPI positioners.

To reserve the Photolithography Room, click here.


CMADP Upcoming Events

Ralph N. Adams Lectureship, KU Chemistry Dept.

R. Mark Wightman, Ph.D.
Professor Emeritus of Chemistry
University of North Carolina, Chapel Hill

Public Lecture "Detecting Catecholamines--A Journey from Beaker to the Behaving Brain"
Thursday, November 15 @ 4:00pm
Integrated Science Building, Room 1154 (Central District)
Reception immediately following lecture in ISB atrium, open to all

Scientific Lecture "Chemical Monitoring of Neurotransmission with Microelectrodes"
Friday, November 16 @ 4:00pm
Integrated Science Building, Room 1154 (Central District)

KU Today