ABM UV Flood Source & Mask Alignment System

ABM Flood Source

The ABM, Inc. i-line (365 nm) near-UV flood source produces light with an intensity of 20 mW/cm2. The automatic shutter is controlled by a timer with 0.1 s precision. An optional long-pass filter cuts out wavelengths below 345 nm.

The substrate chuck and mask frame are planarizable. Both soft contact and adjustable hard vacuum contact are possible. Chuck and frame combinations are available for 4" (square and round) and 6" (round) substrates.

The alignment system from OAI features dual inspection microscopes with CCD cameras. Stage adjustments (x, y, and Θ) can be made using 100 TPI positioners.

To reserve the Photolithography Room, click here.


CMADP Upcoming Events

Analytical Chemistry Seminar co-sponsored by COBRE CMADP
"Oxytocinergic circuits controlling defensive behavior in larval zebrafish"

Adam Douglass, Ph.D.
Assistant Professor of Neurobiology & Anatomy
University of Utah School of Medicine

Monday, September 10 @ 3:30pm
Simons Auditorium, HBC, KU-L West Campus

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